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ASML TWINSCAN models set productivity records

20 November 2008 | By Syanne Olson | News > Lithography

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ASML Holding NV has set a productivity record with its TWINSCAN platform of lithography systems. To date, the company has 76 TWINSCAN systems that have processed more than one million wafers in a 12-month period.

“Three years ago we started an ambitious productivity program. We set a target that a customer should be able to process one million wafers on one scanner within one year. We knew this would require innovative improvements in design as well as improved integration with remote and on-site customer service. Many customers used the opportunity to introduce their own process flow improvements to the program. Thanks to this combined focus and dedication, we managed to set a new standard in lithography productivity,” said Frits van Hout, designate member of ASML’s Board of Management who was in charge of customer service at the start of the program.

In October 2007, the TWINSCAN XT:400E iLine scanner was the first system to process one million wafers within 365 days. The new achievement, one year later, includes the iLine, KrF and ArF models. Around two-thirds of the systems are processing 300mm wafers with the other third processing 200mm wafers.


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