Online information source for semiconductor professionals
ASML drops foray into optical maskless lithography
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Having licensed Micronic Laser Systems spatial light modulator and data-path technology used in optical maskless lithography in late 2004, ASML has dropped the project, according to Micronic Laser. As a result, Micronic Laser is repaying royalty advancements made by ASML to the tune of €13 million, the company said. The original deal included a prepayment of €20 million.
All rights to the technology now pass back to Micronic Laser.