Online information source for semiconductor professionals

ASML drops foray into optical maskless lithography

16 April 2009 | By Mark Osborne | News > Lithography

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Having licensed Micronic Laser Systems spatial light modulator and data-path technology used in optical maskless lithography in late 2004, ASML has dropped the project, according to Micronic Laser. As a result, Micronic Laser is repaying royalty advancements made by ASML to the tune of €13 million, the company said. The original deal included a prepayment of €20 million.

All rights to the technology now pass back to Micronic Laser.

Related jobs

No related jobs found, sorry!

Related articles

ASML touts 11nm capability for EUV lithography - 30 September 2008

CEA-Leti maskless lithography program gains STMicroelectronics - 18 January 2010

Carl Zeiss ships first production ready EUV lithography optics system to ASML - 16 September 2009

E-beam technology takes collective stage at SPIE Lithography Symposium - 23 February 2011

Tool Order: TSMC places follow-on order with ASML - 27 June 2011

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: