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ASML drops foray into optical maskless lithography

16 April 2009 | By Mark Osborne | News > Lithography

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Having licensed Micronic Laser Systems spatial light modulator and data-path technology used in optical maskless lithography in late 2004, ASML has dropped the project, according to Micronic Laser. As a result, Micronic Laser is repaying royalty advancements made by ASML to the tune of €13 million, the company said. The original deal included a prepayment of €20 million.

All rights to the technology now pass back to Micronic Laser.

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