Online information source for semiconductor professionals

ASM teams with Air Liquide on high-k films

10 December 2009 | By Mark Osborne | News > Materials and Gases

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

ASM International has signed a license and preferred supplier agreement for Air Liquide’s ‘ALOHA’ range of high-k precursors used in ALD processing. Air Liquide will also gain access to ASM's ALD processes and material intellectual property related to the deposition of advanced ultra-high-k insulator films such as Yttrium-doped Zirconia, STO and BST.

"It is essential that the whole supply chain, including chemicals, their transportation and storage, deposition equipment and source containers reaches maturity before new materials will be adopted by our customers,” commented Ivo Raaijmakers, Chief Technology Officer of ASM. “The agreement with Air Liquide is a key step to enable ultra high-k materials for the industry."

Related articles

Air Liquide wins new supply contracts with Hynix‚??s 300mm fabs - 10 June 2008

Securing F2 supply for the semiconductor and TFT-LCD industries - 01 September 2003

A Comprehensive Approach for Delivery of Low-vapour-pressure Process Chemicals - 01 June 2001

Air Liquide expects threefold increase in silane production by 2010 - 06 March 2008

Air Liquide America Specialty Gases LLC to raise specialty gas prices - 20 August 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: