Online information source for semiconductor professionals

ASM International and SAFC Hitech team on next generation high-k materials

07 January 2009 | By Mark Osborne | News > Materials and Gases

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Working partners SAFC Hitech and ASM International are developing next-generation high-k materials used in ALD processes in both logic and memory devices. Source materials such as 'cyclopentadienyl' are Strontium- and Barium-based insulators with dielectric constants exceeding 100. A new agreement between the two companies provides certification criteria for the chemical source materials, a license to certain ASM ALD patents to SAFC Hitech and further development of these chemical source materials. The new materials could be required for production of 3x nm nodes for memory devices, beginning around 2011.

"SAFC Hitech has been working closely with ASM's research groups for some time, focusing on evaluation and process development of this class of cyclopentadienyl source materials," added Dr. Peter Heys, Research and Development Director, SAFC Hitech. "This effort has resulted in sources that have demonstrated ALD of high quality, Ultra High-k films. We are now working towards the scale-up for high volume manufacture of both strontium and barium Ultra High-k source precursors. The current target is to have product available in quantities up to and beyond 2011, consistent with ITRS road map requirements and ASM and SAFC Hitech projections."

Related articles

SAFC Hitech opens new cleanroom for product QA and packaging - 29 April 2008

SAFC Hitech & AWI extend development of semiconductor materials in Japan - 29 April 2009

SAFC Hitech expands UK plant to meet trimethylgallium demand from LED industry - 26 March 2010

ATMI and SAFC Hitech team up to market solid source vaporizer technology - 14 July 2009

New Product: SAFC Hitech ready with phase change memory precursors - 09 September 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: