Online information source for semiconductor professionals

AmberWave claims more strained silicon patent infringements against Intel

29 September 2005 | By Syanne Olson | News > Wafer Processing

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

AmberWave Systems Corporation has stated that a newly awarded U.S Patent covering its strained silicon process IP is being used by Intel Corporation without licensing consent.

According to AmberWave, Intel has filed a complaint in the federal district court in Wilmington, Delaware seeking a declaration that it does not infringe the new patent.

In response, AmberWave has filed a complaint against Intel in the federal district court in Marshall, Texas, alleging infringement.

AmberWave has two Patent cases previously outstanding against Intel.

Related articles

Applied Materials and AmberWave in strained silicon pact - 04 February 2005

Intel pays AMD US$1.25 billion to end outstanding litigation - 12 November 2009

Samsung, SanDisk sign flash memory cross-licensing, supply deals - 27 May 2009

Intel and AMD cross swords over cross licensing - 16 March 2009

Independence Day for Globalfoundries - 05 March 2012

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: