STMicroelectronics has placed a multi-million euro order with EV Group
for a number of tools required for processing 300mm wafers for
through-silicon-via (TSV) applications. The tools have been supplied
and installed at STMicroelectronics’ Crolles2 pilot line in Crolles,
France. The tools include EVG’s EVG150 Coater and EVG150 Developer and
its new NanoSpray photoresist coating processing capabilities for steep
topographies as part of its IQ Aligner.
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Eco-Snow Systems, an affiliate of The Linde Group, has announced the
installation of two of its cleaning systems at two U.S.-based MEMS
manufacturers. The Eco-Snow VersaClean system, used for cleaning of
packaging components, and the Eco-Snow WaferClean system for released
device level cleaning prior to wafer dicing, were recently installed at
the two unnamed MEMS companies.
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Rohm and Haas Electronic Materials has announced the opening on June
26th of its new $60 million immersion lithography facility in
Marlborough, MA. The facility, which is fully equipped and has begun
processing wafers, was established to support the company’s R&D in
the area of advanced 193nm lithography materials for semiconductor
applications.
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Cymer has signed a multi-year unit agreement with Toshiba that includes
purchasing and support for krypton fluoride (KrF) and argon fluoride
(ArF) light sources in Toshiba's future 300mm investment plans.
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A groundbreaking ceremony for the new Applied Materials Operations
Center at Changi North Industrial Park in Singapore took place earlier
today, and saw the attendance of several Applied Materials executives,
including Mike Splinter (pictured), company President and CEO. Chairman
of the Singapore Economic Development Board Lim Siong Guan and U.S.
Ambassador Patricia Herbold were also present for the ceremony.
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HamaTech Advanced Process Equipment (HamaTech APE) has said it has
reached a new milestone for its 45nm capable MaskTrack photomask
cleaning system with the shipment of its 30th tool.
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Evonik Industries AG and BASF have announced a joint development
program for next-generation CMP slurries, targeting shallow trench
isolation (STI) and inter-layer dielectric (ILD) processes. Evonik is
to provide various grades of cerium oxide to be used with BASF’s slurry
chemistry.
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Mattson Technology has purchased a SEM MC600i failure analysis tool
from Sela for use in process fine-tuning and customer sampling
purposes. The MC600i was delivered and installed at Mattson in the
first quarter of 2008, the company said.
Texas Instruments has been recognized by the U.S. EPA for
accomplishments in improving air quality and reducing greenhouse gas
emissions. There were 11 winners of EPA’s Clean Air Excellence Awards,
which included TI.
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A Japanese-based IC manufacturer has purchased a Suprema photoresist
strip system from Mattson Technology. According to Mattson, the order
comes from a new account and extends its installed base of Suprema
systems and increases its share of the photoresist strip market.
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