aCymer, Inc. has announced the industry’s first purchase of two of its
90W ArF XLR 600i light sources for applications in volume immersion and
double patterning lithography at the 32nm node and beyond. The tool was
demonstrated in April at Nikon’s Kumagaya, Japan facility, and it is
believed that the tools were purchased by Nikon following the
successful demonstration of its abilities and applications.
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Asyst Technologies has announced its receipt of a tool order to the
value of approximately $15 million over a 12-18 month implementation
period.. The order, which comes from an unnamed major IC manufacturer,
will see the installation of Asyst’s Spartan Integrated Sorter in four
different fabs, replacing equipment installed by a rival in the same
locations, according to the company.
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Rohm and Haas Company has entered into an agreement with The Dow
Chemical Company for the acquisition by Dow of all of the outstanding
shares of Rohm and Haas common stock for $78.00 per share in cash.
Taking into account the approximately 196 million shares held by Rohm
and Haas as of April 22nd 2008, the estimated transaction price is over
$15 billion.
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NexPlanar Corporation has announced its completion of a $14.5 million
round of financing that will enable them to market and commercialize
its new CMP pad technology. The company uses proprietary "nano-domain"
technology, which, according to the company, improves planarity,
across-wafer uniformity and the most advanced CMP applications.
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In an attempt to meet the increasing demand for high-purity silane gas
in the PV and related industries, the Linde Group and Schmid Silicon
Pilot Production have decided to collaborate on silane production via
the joint ownership of a new facility in Dresden, Germany. The silane
produced at this facility will contribute towards the current capacity
for Linde’s customers and will be based on the new Schmid Monosilane
Technology process.
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Numonyx and Elpida Memories have signed a letter of intent to enter
into a foundry agreement that would see Elpida fabricate 65nm NOR flash
devices at its 300mm wafer fab in Hiroshima, starting in mid-2009. The
agreement is expected to be finalized in the current quarter and also
includes 45nm production, though Numonyx did not say whether this would
also include its phase-change memory devices at that node, revealed
earlier this year by the company.
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Semiconductor R&D and engineering costs are rising at a faster rate
than IC sales, according to a new report from IC Insights. R&D and
engineering expenditures increased at a compound average growth rate
(CAGR) of 12.7 percent between 1990 and 2007, while semiconductor sales
grew at a CAGR of 9.9 percent in the 17-year period.
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WIN Semiconductors Corporation has placed a multiple system order with
Aviza Technology, consisting of Sigma fxP PVD, Delta fxP CVD, Omega fxP
and i2L etch systems. The tools will be used for various process
technologies required to fabricate GaAs devices. Shipments will be
completed in the fourth quarter of Aviza’s Fiscal Year 2008.
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Replisaurus Technologies has installed a SUSS MicroTec Gamma coating
cluster that will be used for the development of Replisaurus’
ElectroChemical Pattern Replication (ECPR) technology and process
applications.
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