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MoU signed between Micron and Nanya on joint development

03 March 2008 | Wafer Processing

Mark DurcanMicron Technology and Nanya Technology have confirmed previous reports that the two memory manufacturers were planning a joint venture that could include both a technology and a manufacturing partnership. The two companies have now signed a memorandum of understanding to explore potential partnerships in these areas and expect a definitive agreement to be made in the next few months.

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Tool Order: OIPT garners multiple orders from Malaysia

03 March 2008 | Wafer Processing
OIPTOxford Instruments Plasma Technology Ltd (OIPT) has received 20 tool orders in the month of February, one of which was for five production tools for a manufacturing facility in Malaysia. A separate order included an Ion Beam Cluster System to the value of over £1million (approx. $2 million), according to the company. Read more >>

January semiconductor sales reach $21.5 billion, says SIA

03 March 2008 | Fab Management
SIAThe Semiconductor Industry Association (SIA) has said that worldwide sales of semiconductors in January were $21.5 billion, just 0.03 percent higher than January 2007, and that sales would have been 8.1 percent above last year’s figure if memory devices had been excluded from the figures. Read more >>

Gartner cuts NAND flash market growth for 2008 by half

03 March 2008 | Fab Management

GartnerGartner has reduced its NAND flash growth forecast by half for 2008 due to oversupply conditions in a softening market that is not expected to relent until the third quarter of 2008. Gartner’s previous projection showed close to 30 percent growth for the NAND market in 2008 but the market research firm now believes that a worse than expected pricing environment will cut growth levels to less than 15 percent for the year. 

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Asyst says unsolicited offer was previously rejected

29 February 2008 | Fab Management
AsystAsyst Technologies has said that an unsolicited offer had been rejected by its board of directors for all shares in the company. Asyst said that Gores Group and Aquest Systems’ offer was inadequate and significantly undervalued the company. Read more >>

SanDisk reveals increased capital spending through 2010

28 February 2008 | Fab Management
ToshibaSanDisk executives revealed detailed capital expenditure plans through 2010 at the company’s annual financial analysts day, held on February 26th. SanDisk is the joint manufacturing partner of Toshiba for NAND flash memory. Despite an ASP decline of 60 percent in each of the last two years, SanDisk is projecting its own share of the capital equipment burden to increase sequentially, reaching a peak of $3 billion in 2009. Read more >>

Ibis Technology looking for an exit

28 February 2008 | Materials and Gases
IbisSIMOX-SOI implant equipment company Ibis Technology has employed the investment bank BlueLake Partners to look at ‘strategic alternatives’ for the company that could include offering the company for sale. Read more >>

Nova’s 3090Next CD metrology system integrated into Sokudo’s RF3 track system

27 February 2008 | Lithography

NOVANova Measuring Instruments’ optical critical dimension (CD) metrology platform has been qualified on Sokudo's RF3 coat/develop track systems, the companies have said. The NovaScan 3090Next is an advanced metrology platform for Optical CD Control and shape-profiling, implementing polarized normal incidence spectroscopic scatterometry. 

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AMD and IBM successfully produce first EUV ‘full-field’ test chip

27 February 2008 | Lithography
EUVAMD and IBM have said they have successfully produced a working test chip utilizing “full-field” EUV lithography for the critical first layer - instead of ‘narrow field’ (R&D sample applications) - in the fabrication process across an entire 22mm x 33mm AMD 45nm node test chip. Read more >>

Tool Order: Gigaphoton ships first GT62A 90W laser

27 February 2008 | Lithography
GigaphotonGigaphoton has shipped the first of its new GT62A ArF 90W laser light sources to a lithography equipment company that is designed for double-patterning immersion lithography. Read more >>