Linde North America has launched its new sub-atmospheric dopant gas
source for the semiconductor and related industries. The Genii
Sub-Atmospheric Gas Sources are used for ion implantation and use
chemical complexing or electrochemical generation to deliver a high
performance as required by IC manufacturers.
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Foundry company TowerJazz has entered into a development agreement with Soitec for the development of a turnkey solution for high-end backside illuminated (BSI) CMOS image sensors. With the BSI CMOS market looking set to replace the FSI technology with an expected $800 million take by 2013, the agreement will see the integration of Soitec’s substrates and new Smart Stacking technology with TowerJazz’s manufacturing process.
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After significant polysilicon and wafer price declines in 2009, MEMC executives have become more upbeat about demand and price stability entering the first quarter of 2010 and beyond. In a conference call to discuss fourth quarter results, the company noted that capacity utilization of silicon wafer production was at approximately 80%, with a demand recovery underway in the semiconductor industry, enabling a firming in prices to that sector. In solar, price declines were said to have moderated and the company was now shipping wafers to 10 of the top 25 PV manufacturers, compared to having made shipments to only 2 solar customers at the beginning of 2009.
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Product Briefing Outline: Dow Electronic Materials has introduced the Optivision 4540 CMP Polishing Pad designed to deliver low defectivity and low cost of ownership (CoO) over the pad lifetime. The new pad is formulated with a unique, surfactant-free, polymer chemistry and pore structure to help minimize defectivity and provide higher dielectric film rates in copper barrier polishing. The pad has a dual pore structure that accurately controls polishing while providing a consistent polishing surface over the life of the pad.
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Product Briefing Outline: The NBlend system from Norcimbus, offers a new option for mixed gases, bringing to market unique gas mixing technology that combines a MFC mixing system, surge tank, concentration analyzer and a proprietary Power Purge V controller. It is designed to mix two gasses to an adjustable ratio and supply a variable flow up to 250 standard liters per minute (slpm) continuously, while the concentration analyzer monitors and adjusts the blend ratio to maintain the concentration set point. It provides control accuracy of plus or minus 0.3 percent of the requested ratio, allowing it to deliver consistent results with varying flow rates and adjustable blend ratios.
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By Chuck Extrand, Entegris, Chaska, Minnesota, USA - ABSTRACT - Polymers, commonly referred to as plastics, are widely used in the manufacturing of microelectronic devices. In addition to their many desirable properties, such as low cost, light weight, strength, ductility and ease of processing, polymers can be created free of metals and inorganic constituents that may interfere with sensitive clean room fabrication processes in multiple ways. For example, the loose molecular structure of polymers may allow the unwanted permeation of gases and simple liquids in fabrication facilities. This paper will provide a brief introduction to factors that influence permeation through polymers, discussing polymer structure background and its relation to permeation, and the influences of various polymer properties on permeation.
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