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Solar Semi Engineering buys Edwards’ chemicals division
01 September 2010
Solar and semiconductor start-up Solar Semi Engineering (SSE) has completed the acquisition of the business and assets of Edwards’ Chemical Management Europe (CME) division. The deal, the cost of which was not disclosed, will see SSE continue the marketing of Edwards’ CME products along with its own wet process equipment to the solar and semiconductor manufacturing industries.
Read more >>Sandia National Laboratories re-selects Matheson Tri-Gas for gases supplies
17 June 2010
Continuing a ten-year primary supplier deal, Sandia National
Laboratories has re-selected Matheson Tri-Gas to supply gases and
equipment. The new supply deal includes industrial, specialty and
electronic gases required at the Sandia’s labs.
Read more >>Tool Order: PVA TePla to supply crystal growing systems Tianjin HuanOu Semiconductor
16 June 2010
PVA TePla has received an order for two of its floatzone crystal growing systems from Tianjin HuanOu Semiconductor Material & Technology. The equipment is expected to be used for producing high-purity semiconductor components. The order will be processed through to the first quarter of 2011.
Read more >>Product Briefings
New Product: New GORE ePTFE filters improve liquid filtration performance
26 November 2009
Product Briefing Outline: W. L. Gore & Associates has announced an addition to their line of high-performance cartridge filters for semiconductor applications. The new 40nm-rated filter, intended for use with chemicals in wet processes and distribution systems, provides 40nm retention while maintaining the flow of next-best-in-class 50nm filters. Incorporating a new high-flow ePTFE (expanded polytetrafluoroethylene) filtration media that allows a drop-in retention upgrade from 100nm to 30nm, enables cleaner recirculation baths, reduced processing times and significant savings in cost of ownership.
Read more >>New Product: Dow’s new copper polishing pad offers reduced chatter and micro-scratch defectivity
01 October 2009
Product Briefing Outline: Dow Electronic Materials has introduced the Optivision 4540 CMP Polishing Pad designed to deliver low defectivity and low cost of ownership (CoO) over the pad lifetime. The new pad is formulated with a unique, surfactant-free, polymer chemistry and pore structure to help minimize defectivity and provide higher dielectric film rates in copper barrier polishing. The pad has a dual pore structure that accurately controls polishing while providing a consistent polishing surface over the life of the pad.
Read more >>New Product: Norcimbus’ NBlend variable flow gas mixing system saves significant material loss
20 July 2009
Product Briefing Outline: The NBlend system from Norcimbus, offers a new option for mixed gases, bringing to market unique gas mixing technology that combines a MFC mixing system, surge tank, concentration analyzer and a proprietary Power Purge V controller. It is designed to mix two gasses to an adjustable ratio and supply a variable flow up to 250 standard liters per minute (slpm) continuously, while the concentration analyzer monitors and adjusts the blend ratio to maintain the concentration set point. It provides control accuracy of plus or minus 0.3 percent of the requested ratio, allowing it to deliver consistent results with varying flow rates and adjustable blend ratios.
Read more >>White Papers
Edition 38: The permeation resistance of polymers
27 January 2009
By Chuck Extrand, Entegris, Chaska, Minnesota, USA - ABSTRACT - Polymers, commonly referred to as plastics, are widely used in the manufacturing of microelectronic devices. In addition to their many desirable properties, such as low cost, light weight, strength, ductility and ease of processing, polymers can be created free of metals and inorganic constituents that may interfere with sensitive clean room fabrication processes in multiple ways. For example, the loose molecular structure of polymers may allow the unwanted permeation of gases and simple liquids in fabrication facilities. This paper will provide a brief introduction to factors that influence permeation through polymers, discussing polymer structure background and its relation to permeation, and the influences of various polymer properties on permeation.
Read more >>Emerging materials in semiconductors
01 March 2008
Mark Thirsk & Mike Corbett, Linx Consulting LLC,
Massachusetts, USA
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High-k/metal gate materials and processes for 32nm technology
01 December 2007
C. S. Park, G. Bersuker, S. C. Song, P. Kirsch & B. H. Lee, SEMATECH, Austin, Texas; R. Jammy, IBM assignee to SEMATECH
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