With the return of former Lithography Director at SEMATECH, Michael Lercel, to IBM the R&D center has appointed Dr. Bryan J. Rice and Dr. Stefan Wurm as Director and Associate Director of its Lithography Division. As lithography technology enters a critical phase within the semiconductor industry, the appointments are crucial to SEMATECH’s research efforts in this field.
Dr. Bryan J. Rice is an Intel Corporation assignee at SEMATECH and has recently served as the immersion program manager. Dr. Stefan Wurm is known for his work in the field of EUV Lithography, most recently serving as SEMATECH’s EUV program manager and is on assignment from Advanced Micro Devices which he recently joined as a Principal Member of Technical Staff.
Rice holds a doctorate in nuclear physics from Duke University as well as a bachelor’s degree in physics and a master’s degree in computer science from the Georgia Institute of Technology. He has made eleven U.S. patents and is the author of numerous publications on lithography and metrology.
Wurm holds a doctorate in physics from the Technische Universität München, Germany. He has made more than ten U.S. and non-U.S. patents and is the author of multiple publications covering lithography, fundamental research, semiconductor technology and manufacturing.