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Chris Mack to become editor of SPIE Journal
23 February 2011 | By Mark Osborne | Going Places
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Replacing another litho guru in 2012, Chris Mack is to become editor of ‘Journal of Micro/Nanolithography, MEMS, and MOEMS,’ produced quarterly by SPIE. The appointment is effective 1 January 2012 and Mack replaces recently promoted Burn Lin, Senior Director of Nanopatterning Technology, TSMC in the editor role.“I am thrilled that Chris Mack has accepted the position of editor of JM3,” said SPIE Publications Committee Chair John Greivenkamp (College of Optical Sciences, University of Arizona). “Dr. Mack is an internationally recognized expert in lithography who brings a wealth of knowledge, insight and enthusiasm that will be a great benefit to the journal and the entire technical community.”