Online information source for semiconductor professionals

Chris Mack to become editor of SPIE Journal

23 February 2011 | By Mark Osborne | Going Places

Popular articles

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

Chris MackReplacing another litho guru in 2012, Chris Mack is to become editor of ‘Journal of Micro/Nanolithography, MEMS, and MOEMS,’ produced quarterly by SPIE. The appointment is effective 1 January 2012 and Mack replaces recently promoted Burn Lin, Senior Director of Nanopatterning Technology, TSMC in the editor role.

“I am thrilled that Chris Mack has accepted the position of editor of JM3,” said SPIE Publications Committee Chair John Greivenkamp (College of Optical Sciences, University of Arizona). “Dr. Mack is an internationally recognized expert in lithography who brings a wealth of knowledge, insight and enthusiasm that will be a great benefit to the journal and the entire technical community.”

Related articles

Optical lithography: the long goodbye - 01 June 2004

Design for Energy Efficiency Adds Value to Semiconductor Company Shareholders - 01 December 1999

Discussion topic: Double Patterning technical concerns and its impact on fab operations - 01 March 2006

Trade Talk: SEMI‚??s ‚??Best of West‚?? product awards - 13 March 2008

CMP restructures point EE Times towards web 2.0 - 22 June 2007

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: