Online information source for semiconductor professionals
Chris Mack to become editor of SPIE Journal
23 February 2011 | By Mark Osborne | Going Places
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
Replacing another litho guru in 2012, Chris Mack is to become editor of ‘Journal of Micro/Nanolithography, MEMS, and MOEMS,’ produced quarterly by SPIE. The appointment is effective 1 January 2012 and Mack replaces recently promoted Burn Lin, Senior Director of Nanopatterning Technology, TSMC in the editor role.“I am thrilled that Chris Mack has accepted the position of editor of JM3,” said SPIE Publications Committee Chair John Greivenkamp (College of Optical Sciences, University of Arizona). “Dr. Mack is an internationally recognized expert in lithography who brings a wealth of knowledge, insight and enthusiasm that will be a great benefit to the journal and the entire technical community.”