Martin van den Brink, Executive Vice President of Technology and Marketing for ASML, has become the eleventh recipient of SEMI’s annual Bob Graham Award, which is awarded for outstanding contributions in semiconductor equipment and materials marketing. Van den Brink has been with ASML for 25 years, with 15 years as a technologist and more recently as a marketing executive.
Eligible candidates are nominated by their industry peers and are selected by an award committee comprised of members of the Sales and Marketing Executive Council of SEMI (SMECS), which includes past recipients of the Bob Graham Award.
“Martin van den Brink’s commitment and contributions to leading-edge lithography for semiconductor manufacturing has ultimately resulted in the implementation of many leading-edge litho solutions used in fabs today,” said Stanley T. Myers, President and CEO of SEMI. “On behalf of SEMI and its membership, I am pleased to recognize Martin van den Brink for his contributions to the success of our industry.”
The SMECS committee also noted that van den Brink was innovative and adaptable, as shown by getting customers to share the risk with 157nm lithography and then quickly adapting to 193nm ArF immersion technology when the other failed to be adopted due to technical hurdles.
More recently the success of the introduction of the Twinscan platform for immersion lithography was noted as this meant ASML had to convince users that a high-output tool at a high price can be a cost effective solution.