Online information source for semiconductor professionals

Intel to go revolutionary

26 April 2011 | By Mark Osborne | Editor's Blog

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

A technology revolution rather than a political revolution is in the wings at Intel and should be made public around the time of its analyst event in early May. Paul Otellini noted in Intel’s recent quarterly conference call that when we see the anticipated announcement we would all understand why the phrase ‘revolutionary’ would be appropriate.

The classic problem in any aspect of the semiconductor industry is that using revolution to describe a new product is as overdone as most food cooked at a barbecue.

However, for what its worth it shouldn’t be an IC device Intel will announce but the use of a completely different piece of process equipment that has never before been used in volume manufacturing.

Otellini’s revolutionary comments were on the back of announcing they would increase capital spending in 2011 by a further US$1.0 billion. Much of that added spending would directed at the 14nm node though some would be allocated to ramp at the 22nm node that bit bigger as demand was proving extremely strong for its latest MPU’s.

Executives noted that although its 2-year node migrations hadn’t shortened it would the pace of new node ramps that would happen more quickly, giving Intel more bang for the CapEx buck over time.

Many should know that EUV lithography has a small window of opportunity to enter volume production at the 14nm node with Intel. Production tools would need to be working at Intel’s recently announced new (huge) development fab a year before volume production starts and at this point in time that could actually happen.

My bet is that the revolution Intel is going to announce is the move to EUV for the 14nm node ramp.

Related articles

New wave of job cuts at Intel touted - 01 September 2006

New Product: Defect inspection tool from KLA-Tencor captures progressive defects on photomasks - 17 February 2006

Marvell‚??s foundry move spells end of Intel‚??s Colorado fab - 29 June 2007

Intel pays AMD US$1.25 billion to end outstanding litigation - 12 November 2009

Intel Ireland employees safe despite JV Flash venture - 23 May 2007

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: