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Home arrow Wafer Processing arrow Articles arrow Edition 19 - Published July 2003 arrow 19th Edition: IBM’s SiGe BiCMOS tec...
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19th Edition: IBM’s SiGe BiCMOS technology roadmap Print E-mail
Apr 01, 2003 at 10:38 AM
D. L. Harame, G. Freeman, D. Ahlgren, J. S. Dunn, D. Greenberg, A. Joseph, J.-S., Rieh, B. Jagannathan, S. A. St. Onge, D. Coolbaugh, V. Ramachandran, J. Johnson, P. Cottrel, R. Singh, C. Dickey, M. Meghali, S. Subbanna, O. Schreiber & T. Tanji, IBM

ABSTRACT

This article reviews the evolution of IBM's SiGe BiCMOS technology roadmap. It begin  with a discussion of the wireline communications products that drive the initial high-performance target of the roadmap: the latest advanced CMOS and highest performance (high fT and fMAX) HBT. These requirements establish the CMOS integration approach and drive the initial SiGe HBT design. Subsequent wireless and storage demands are focused on traditional radio requirements: Optimization of the HBT for low noise, low distortion and higher breakdown voltages.


These product segments further drive the derivative technologies to more simplified states for lower cost and faster TAT. Taking this perspective on the evolution of the SiGe BiCMOS reveals that the roadmap for the this technology has been developedto serve dissimilar markets with a flexible technology backbone that provides a path to reduce cost and time to market.
icon 05 - IBM's SiGe BiCMOS technology roadmap

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