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Fine droplet liquid vaporizor system |
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Sep 27, 2005 at 10:22 PM |
 Product Briefing Outline: Emerson Process Management
has formed a strategic alliance with MSP Corporation to incorporate
Brooks Instrument flow control technologies into the design of the MSP
Model 2800 Turbo-Vaporizer. The Model 2800 Turbo-Vaporizer is an
enabling technology that has already demonstrated proven
performance for depositing hafnium-based high-k dielectric films in
commercial DRAM production. Two Brooks mass flow devices in the
vaporizer make this capability possible.
Problem: Today's leading edge dielectric and metal films require
delivery of complex liquid molecules to the process chamber. Current
vaporization technology can destroy these complex molecules due to
longterm exposure to high temperatures, braking the
internal bonds of the precursors. Problems also exist in controlling
the liquid mass delivery with a high level of accuracy independent of
fluid properties.
Solution: This unique new vaporization system solves many of the
quality and yield issues attributed to traditional liquid vaporizers
used in and ALD semiconductor processes. The result is a high
performance solution that can be used to vaporize
new Brooks MSP Model 2800 Turbo-VaporizerTM precursors needed in the
semiconductor industry to create advanced films. The Model 2800
Turbo-Vaporizer
is a direct liquid injection (DLI) vaporizer that uses fine droplet
technology to vaporize temperature-sensitive liquid precursor
chemicals. It virtually eliminates particulate formation when compared
to conventional flash vaporizers, where precursor thermal decomposition
leads to degraded film quality, contaminated wafers, loss
of product yield, and unreliable vaporizer operation. The MSP
Turbo-Vaporizer uses a Brooks QUANTIM Coriolis mass flow controller for
precise delivery of precursor liquids and a Brooks thermal mass flow
controller (MFC) for the carrier gas assist system. The Coriolis sensor
at the heart of the QUANTIM flow controller measures fluid mass
directly, independent of physical properties of the fluid, making it
more versatile for use with a wide range of liquid precursors.
Applications: CVD & ALD processes.
Platform: The model 2800 is now standard equipped with Brooks
Instrument liquid and gas MFC's. The 3 stage vaporizer uses VCR
fittings for inlet and outlet. A
liquid shutoff vale is provided and closely located to the atomizer tp provide positive liquid shutoff.
Availability: July 2005 onwards.
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Product Briefings 
