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Versatile highly efficient AMC filter |
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Sep 27, 2005 at 09:41 PM |
 Product Briefing Outline: Donaldson has launched
"ChemCore" an innovative low pressure drop, high efficiency filtration
media that is design to control ambient amines and acids affecting
semiconductor lithography tools and processes. It is also highly
effective for a retrofit solution for tracks, stockers and filter fan
units.
Problem: Designed to meet applications where pressure drop, both
initially and over the life of the filter as well as when laminar flow
and physical constraints limit the use of packed-bed carbon filters.
There is a need to meet the increased demand for a cost-effective
method to control ambient amines and acids affecting semiconductor
lithography tools and processes.
Solution: The development of this new media was a result of a
clear focus on the need for an AMC filter that could be both
retrofitted into current tools without sacrificing the efficiency of
carbon tray filter and without the particulation issues associated with
pleated carbon media. The ChemCore filters combine a proven filter
media technology in a lightweight, low pressure drop form factor. It
removes acids, bases (amines, NMP, NH3)
and condensable organics.
Applications: Acids, bases (amines, NMP, NH3) and condensable
organics. A retrofit solution for tracks, stockers filter fan units
amongst some of the applications.
Platform: Can be retrofitted to Dai Nippon Screeen's
SK-80B/-2000/-300, RF3. FSI's Polaris 2200/2500/3500and Tokyo
Electron's Mark-8, ACT-8, Act-12 tracks.
Availability: August 2005 onwards.
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Product Briefings 
