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FEOL wet station for volume production at 65nm & below |
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Sep 27, 2005 at 07:58 PM |
 Product Briefing Outline: Dainippon Screen
has introduced its next generation 300mm automated wet station, the
FC-3100. The new FC-3100 is Screen's next generation automated wet
station built on the foundation of, the FC-3000 and is designed to
tackle Front End of Line (FEOL) cleaning applications that demand
highly stable processes. Enhancements made to the FC-3100 are designed
to provide greater process performance, stability, reliability, and
cost of ownership, according to the company.
Problem: Continuing reductions in device geometries
and cost factors associated with 300mm production fabs impose
increasing challenges on wafer processing
equipment, such as wafer cleaning. Improvements to wet stations are
required to limit cross contamination, water marks and metal
contamination, while lessening damage due to cleaning, oxide film loss
and film growth.
Solution: The FC-3100 employs a new modular design,
improving configuration flexibility while suppressing manufacturing
lead times and set-up time in customer's
facilities. Improved robotics, new buffer design, and robust wafer
scheduling algorithms provide 460 wafer per hour mechanical throughput
capability, according to the company. New process technologies offered on the FC-3100 include the
SCC or Single Chamber Clean module. The SCC combines the attributes and
capabilities of the
Once through Bath (for dilute chemical cleaning) and Low Pressure Dryer
(LPD) in a single unit with controlled ambient processing. Both the
FC-3000 and FC-3100 feature other new technologies that are
indispensable in 65nm processing, including; a low temperature drying
option for dual gate applications, a Phosphoric Acid Concentration
Feedback System that precisely measures and controls acid/water
concentrations.
Applications: FEOL wafer cleaning for 300mm wafers
Platform: The new FC-3100 is
Screen's next generation automated wet station built on the foundation
of, the FC-3000. The proprietary scheduler software developed by
Dainippon Screen automatically computes the best production schedule,
even when multiple recipes are used simultaneously or when chemicals
need to be exchanged or replenished. It instantly identifies which bath
is available, determines where wafers should be supplied, and
calculates how much time is required. Preventing overprocessing caused
by time errors, it provides a more accurate and product-tailored
schedule for high-end processes.
Availability: July 2005 onwards.
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Product Briefings 