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Immersion lithography keeps on track |
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Sep 23, 2005 at 01:59 PM |
At the end of the fourth day of the symposium on Immersion lithography,
attendees remain confident that immersion will enter volume production
at the 45nm node.
"With more than 380 lithographers attending the 2nd International
Symposium on Immersion Lithography, broad support to develop immersion
lithography was clearly shown," said Kurt Ronse, general chair of the
Symposium and Lithography Department Director at IMEC. "This strong
drive has resulted in significant progress on all critical issues and a
general acceptance that immersion lithography will be a key technology
for 65nm and 45nm half pitch critical layer printing."
The tough questions still remain as to the defect levels being
acceptable for production as well as the pros & cons of using
topcoats for the resists. Considerable progress would seem to have been
made in reducing water/resist-induced defects, but more work is
required.
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