Walter F.Worth, International SEMATECH, Austin, Texas, USA

ABSTRACT

For the last three years, International SEMATECH has had an active program to identify potential environment, safety, and health (ESH) impacts associated with the development of advanced lithography technologies. The focus has mainly centered on 157-nm lithography, 193-nm immersion lithography, and extreme ultraviolet (EUV) lithography. Through close collaboration with the technologists in SEMATECH's lithography division, it is hoped that ESH concerns can be identified and addressed during the early stages of the materials selection and process/tool development, well in advance of their introduction into high-volume manufacturing (HVM).