21st Edition: Advanced process control and intelligent metrology

Feb 16, 2004 at 02:20 PM

James Moyne, Brooks Automation, Inc.

ABSTRACT

Advanced process control (APC) capabilities such as "run-to-run control" are now required components of lithography system solutions. Unfortunately these control solutions, usually targeting overlay and CD control, have generally been developed from the ground up with non-standard APC automation strategies.

21st Edition: Advanced process control and intelligent metrology strategies for lithography processes

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