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27th Edition: SEMI® F57-0301 and beyond:Advancing standards |
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Aug 21, 2005 at 02:01 PM |
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James M. Hanson, Swagelok Company, Ronnie A. Browne & Robert A. Shutler, Swagelok Semiconductor Services Company, Santa Clara, California, USA
ABSTRACT New wet processes for semiconductor manufacturing, employing slurries, as well as HCl and HF at higher pressures and temperatures, are requiring higher standards for purity and improved design and materials for fluid-system components. OEMs, toolmakers and integrators are calling for longer life cycles, easier maintenance, resistance to permeation and reduced particle shedding in valves and other system components.
27th Edition: SEMI F57-0301 and beyond: Advancing standards for ultra high-purity fluoropolymer components
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