Brad Stimson & Alan Ritchie, Applied Materials, Inc., Santa Clara, CA, USA

ABSTRACT

Physical Vapor Deposition (PVD) systems are among the most widely used systems in fabs. To extend PVD technology, a highly successful platform has been redesigned to meet sub-90nm requirements. Over 14 years of being used in production (which continues till today), vast modifications were made to both the PVD mainframe unit and its chambers to keep abreast of ever changing design nodes and device designs.