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Home arrow Wafer Processing arrow Articles arrow Edition 27 arrow 27th Edition: Barrier metal layers create growing
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27th Edition: Barrier metal layers create growing Print E-mail
Aug 21, 2005 at 11:25 PM

Dr. Paul Ryan, Dr. Matthew Wormington & Helen Parnell, Bede X-ray Metrology, UK

ABSTRACT

With the move to 90nm technology nodes and beyond, manufacturers are looking at all stages of semiconductor fabrication to ensure that current process technologies are a match for increasingly demanding requirements. Metrology is no exception. 

27th Edition: Barrier metal layers create growing requirement for advanced metrology





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