Cymer said at this week's Sematech EUV Source Workshop in New York that it has reached a milestone 25 watts of average extreme ultraviolet (EUV) power continuously for 1 1/2 hours' duration, and is on track to achieve the 100 watts of average power needed for production-ready EUV lithography tools in 2009. 

“Just three months after achieving 35 watts of EUV power for a short burst, Cymer has made significant progress in reaching 25 watts of average EUV power for more than one hour,” said Ed Brown, President and Chief Operating Officer for Cymer. “This power and duration achievement paired with the completion of our EUV manufacturing facility reflects Cymer’s commitment to EUV and the commercialization of future lithography tools.”

Cymer has developed a laser-produced plasma (LPP) system consisting of a multi-staged carbon dioxide laser and tin droplet target.