The first 90W argon fluoride (ArF) laser light source to enter the market has been installed at Nikon’s Kumagaya, Japan facility by Cymer. The system is designed for volume immersion and double patterning photolithography at the 32nm node and beyond. 

"This milestone install signifies the growing adoption of Cymer's XLR platform by leading lithography tool suppliers," said Ed Brown, President and Chief Operating Officer at Cymer. "The industry’s first 90W system illustrates our ongoing mission to provide customers with the highest performance and lower operating costs meeting chipmakers' high-volume manufacturing needs."