Cymer, Inc. has added Dr. Chris Progler (pictured) and Dr. Patrick Naulleau to its Scientific Advisory Board (SAB). Dr. Progler is CTO and Executive Vice President for Photronics, while Dr. Naulleau joins the company as Lead Scientist for Lawrence Berkeley Lab’s Center for X-Ray Optics. 

Dr. Progler brings experience from the Industrial Advisory Board for the University of Texas at Dallas’ School of Engineering to the Cymer SAB, and is also an SPIE fellow and Chair for the SPIE Advanced Lithography Symposium. A much-published author and holder of several patents in lithography, Dr. Progler is also an associate editor for the Journal of Microlithography, Microfabrication and Microsystems.

Dr. Naulleau oversees research and development and project management for Lawrence Berkeley Labs’ nanolithography and nano-optics technologies. He is also a visiting professor to the electrical engineering and computer sciences department at the University of California at Berkeley. Dr. Naulleau has presented at over 60 technology conferences, holds more than 30 patents and has been published in more than 170 technology journals.

“We are honored Dr. Progler and Dr. Naulleau have accepted the invitation to join our Scientific Advisory Board,” said Bob Akins, co-founder and CEO of Cymer. “Their addition to our already stellar roster of advisory board members will be critical in meeting the ongoing industry demands of Moore’s Law through the research and development of advanced DUV and EUV lithography solutions.”

Cymer, Inc. is a DUV laser provider.

By Síle Mc Mahon