POWERLASE is to supply nanosecond Q-switched, diode-pumped solid state (DPSS) lasers to the Extreme Ultraviolet Lithography System Development Association (EUVA) for research efforts to perfect the use of discharge-produced plasma (DPP) light source.
“The requirement for a viable EUVL technology is becoming increasingly important, as traditional techniques reach the end of their lifespan,” said Dr Samir Ellwi, POWERLASE Vice President of Strategic Technology. “As such, we are very pleased to begin a new phase of research with the EUVA. The continued partnership will ensure the deadline for the creation of a 32nm technique is achieved.”
POWERLASE is currently engaged in research projects with the University of Central Florida (UCF) and University College Dublin (UCD).
Readers' comments
Comment by GUEST on 2008-04-11 16:08:38 What are they thinking? They missed 32nm and will miss the future. We do not need EUV to go past 32nm.