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Home arrow Lithography arrow Edition 36 arrow 36th Edition: Developing micro ADI methodology for new litho process monitoring stra...
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36th Edition: Developing micro ADI methodology for new litho process monitoring strategies Print E-mail
Apr 07, 2008 at 03:12 PM

Iris Mäge & Uwe Seifert, Qimonda AG, Dresden; Barry Saville & Martin Tuckermann, KLA-Tencor GmbH, Dresden

ABSTRACT

With the introduction of sub-100nm design rules, and especially 193nm photolithography, the development of new monitoring strategies is becoming increasingly important and necessary as new materials, new tools and new process challenges are introduced. Micro after-develop inspection (µADI) is a big step forward for photolithography defect monitoring as well as for integrated process learning.

36th Edition: Developing micro ADI methodology for new litho process monitoring strategies
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