Online information source for semiconductor professionals

Tool Order: NanoTecCenter Weiz opts for EVGroup’s mask aligner

11 March 2008 | By Síle Mc Mahon | News > Wafer Processing

Popular articles

Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008

Numonyx to close California Technology Center - 12 August 2008

Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008

Micron close to Inotera share purchase, says Gartner - 06 October 2008

Applied Materials sees higher CapEx spending for 2009 - 15 August 2008

EVAustria-based NanoTecCenter Weiz Forschungsgesellschaft mbH (NTC Weiz) has placed an order with EV Group for an EVG620 precision alignment system. NTC Weiz will use the system for its new R&D facility, which will be focussed on organic/plastic electronic technologies.

"Our new R&D cleanroom will be focused on next-generation organic semiconductor technology-one of the fastest-growing areas of the electronics industry, and one with the greatest potential for yielding paradigm-shifting products," said Professor Emil List, scientific Managing Director at NTC Weiz. "To ensure the highest-quality results, we need state-of-the-art equipment for this new line. Our competitive evaluation, together with EVG's reputation for innovative yet reliable systems and solutions, convinced us that they are the ideal partner for our latest research venture."

Related jobs

Manufacturing Engineer - Axcelis Technologies - Beverly, 14 August 2007

E Beam Site Engineer - Carl Zeiss SMT, Inc. - San Jose, 10 August 2007

Technical Support Engineer - Carl Zeiss SMT, Inc. - Peabody, 10 August 2007

Electrical engineering - Axcelis - Beverly, 10 August 2007

Senior Applications Engineer - Axcelis - Beverly, 09 August 2007

Related articles

Tool Order: Heptagon Micro-Optics purchases EV Group’s IQ Aligner - 14 July 2008

Novel electron-beam-based photo-mask-repair technology - 01 March 2004

An Integrated Phase-shifting Software Solution for IC Design to Manufacturing - 01 March 2000

An Overview of Cost of Ownership for Optical Lithography at the 100 nm and 70 nm Generations - 01 March 2000

Brion and NuFlare collaborate to enhance mask equipment technology - 06 November 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: