GenISys GmbH has said that a further three U.S. research institutions have adopted its advanced e-beam lithography software, namely, Oak Ridge National Laboratory, Argonne National Laboratory and the California Institute of Technology. 

“GenISys is dedicated to offering needed solutions for e-beam direct write. They are responsive and fast in development, and they are providing the support needed for implementing their advanced solutions into our research and our user program,” said Scott Retterer, Research Scientist in the Center for Nanophase Material Science at Oak Ridge National Laboratory.

Layout BEAMER integrates proximity effect correction (PEC) software specific to e-beam lithography requirements with data-preparation and process simulation and correction.