Online information source for semiconductor professionals

New Product: Agilent offers long-life DUV optical coatings

21 February 2008 | By Mark Osborne | Product Briefings > Lithography

Popular articles

Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008

Numonyx to close California Technology Center - 12 August 2008

Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008

Micron close to Inotera share purchase, says Gartner - 06 October 2008

Applied Materials sees higher CapEx spending for 2009 - 15 August 2008

AgilentProduct Briefing Outline: Agilent Technologies has announced the availability of deep-UV optical coating, offering long-lifetime optics that address the growing need for highly accurate and reliable beam delivery in leading-edge semiconductor photolithography systems.

Problem: UV Lithography Systems utilize lasers that can pump 100 million shots per week through an optical system.  Because of the short wavelength and high power of the laser, material interactions in the substrate and coating layers are much more pronounced than in visible and near-IR wavelengths.  In particular, typical UV-grade fused silica substrates suffer significant and permanent changes in their properties when irradiated by millions of high-power laser pulses.  In addition, the high fluence laser pulses can cause the thin-film coating layers to compact through photochemical interactions, resulting in a coating shift that can cause a 95 percent reflector to drop below 90 percent.
 
Solution: Agilent has developed proprietary high-throughput UV coatings that increase component lifetime while minimizing compaction. These long-lifetime optics reduce production costs by extending the time between required maintenance cycles and reducing system downtime.  AR coated calcium fluoride prisms offer an alternative to flat turning mirrors.  Calcium fluoride is more robust than UV-grade fused silica, and has been shown to withstand billions of pulses without serious compaction issues.  Al2O3/AlF3 or LaF3/MgF2 or similar thin-film anti-reflection coatings on the prisms have very low layer counts that allow very little compaction in the coating layer.  By limiting the number of layers and mitigating compaction issues, the effective bandwidth of the thin film coating can be expanded to allow a much wider acceptance angle at the entrance and exit faces, improving the performance of the optical system.

Applications: DUV optics

Platform: Reflectivity and damage-threshold testing have been successfully completed, and in independent tests Agilent has qualified multiple coating chambers, thus ensuring product availability.

Availability: January 2008 onwards.

Related jobs

Quality Assurance Engineer - Tokyo Electron Limited - Santa Clara , 30 October 2007

Semiconductor Photo Line Maintenance Technician - AMI Semiconductor - Pocatello, 02 October 2007

Design Engineer/System Architect - AMI Semiconductor - POCATELLO, 10 August 2007

Technical Support Engineer - Carl Zeiss SMT, Inc. - Peabody, 10 August 2007

Senior Applications Engineer - Axcelis - Beverly, 09 August 2007

Related articles

Important Aspects of DUV Optical Components - 01 June 2000

193 nm Microlithography and DUV Light Source Design - 01 March 1999

New Product: Hach Ultra’s MET ONE 6000 offers continuous particle monitoring - 15 May 2008

Spectroscopic Ellipsometry (SE) for materials characterization at 193 and 157nm - 01 September 2002

The Role of Resists in Extending Optical Lithography - 01 December 1999

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: