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New Product: Nanometrics targets advanced CD control issues with NanoCD Suite |
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Feb 11, 2008 at 04:05 PM |
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 Product Briefing Outline: Nanometrics has released its NanoCD Suite, which is composed of four key optical critical dimension (OCD) metrology solutions: NanoGen; NanoMatch; NanoStation and NanoDiffract. When NanoCD Suite is combined with its Atlas standalone and 9010 integrated metrology systems, it provides a complete OCD solution that can measure and model all 45nm and smaller devices, including scribe line process control targets and advanced die structures, as well as advanced R&D structures for 32nm and 22nm nodes, providing the necessary metrology for critical process control.
Problem: Beyond traditional scatterometry metrology and film analysis, the NanoCD Suite leverages all the data from all process flows and lets the user input that knowledge into the models for accurate and precise structural metrology. The NanoCD Suite can be used to solve critical CD control problems in lithography and etch, as well as demanding next-generation film thickness, CD, erosion, and microstructure control in CVD, CMP, ALD, and Epi process modules.
Solution: The Nanometrics NanoCD Suite is designed to optimize the full capability and connectivity of Nanometrics’ Atlas and 9010 systems for OCD metrology. NanoCD offers industry-proven modeling methods, as well as next-generation real-time regression capability, comprehensive offline sensitivity analysis tools, fast library generation and full GUI and structure input for true multi-variant modeling. The NanoDiffract software delivers these advanced capabilities in intuitive and easy to deploy hardware form factors, which include: the NanoGen, an offline server-based library generation system; the NanoMatch, a high power computing system incorporated within the Atlas or 9010 metrology system for real-time analysis; and the NanoStation, an offline desktop system used for recipe and library generation.
Applications: CD control issues in lithography and etch, as well as film thickness, CD, erosion, and microstructure control in CVD, CMP, ALD, and Epi process modules.
Platform: NanoCD Suite comprises four key optical critical dimension (OCD) metrology solutions: NanoGen; NanoMatch; NanoStation and NanoDiffract, which works in collaboration with Nanometrics, Atlas standalone and 9010 integrated metrology systems.
Availability: January 2008 onwards.
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Product Briefings 
