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Surface Technology
Systems PLC will be launching new etch systems utilizing Brooks Automation's
"Marathon Express" family of vacuum cluster tool automation platforms.
"The Brooks
vacuum automation platform is an important enabler for STS, allowing us to
focus our R&D investments more efficiently on our core process
technologies," commented Leslie Lea, Deputy Chief Executive Officer and
Chief Technical Officer at STS.
"By utilizing the Marathon Express from Brooks as the backbone for
our tool design, we immediately have a proven, world-class platform upon which
to quickly bring to market our leading etch and deposition technologies for key
emerging industries such as MEMS, compound
semiconductors, photonics, wafer-level packaging and data storage."
STS's , latest tool
is called CPX, that enables multiple process chambers to share a common wafer
transport system. Designed to reduce
the cost for mass production of devices used in end markets such as printer inkjet
heads and wireless communications,
CPX provides a single
wafer automation platform to service up to four STS plasma process modules,
thus reducing the overall cost of the system by reducing fab footprint,
operator cost and equipment cost, according to the company.
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