Erik N. Hoggan, Brian J. Novick & Ruben G. Carbonell, North Carolina State University, Raleigh, NC, USA; Joseph M. Desimone, University of North Carolina at Chapel Hill, Chapel Hill, NC, USA

ABSTRACT

The majority of coatings for processes in integrated circuit manufacturing are formed using water, organic solvents or dry deposition techniques such as chemical vapour deposition (CVD). We are investigating the formation of high quality coatings using a high-pressure condensed gas, carbon dioxide CO₂). Coating techniques using condensed CO₂ may help eliminate many of the environmental and other challenges inherent in conventional solvent systems by taking advantage of the unique properties of this
high-pressure fluid.