NEC Electronics has placed a significant order for Brion’s Tachyon OPC+ optical proximity correction (OPC) product that will be used for 40nm designs. NEC had previously used Brion’s Tachyon RDI lithography simulation and design inspection system for 65nm designs. 

“Consolidating all our computational lithography tools on the Tachyon platform is a natural progression for NEC,” said Shuichi Inoue, General Manager, process technology division, at NEC’s manufacturing operations unit. “Brion offers a complete suite of computational lithography tools, which work together to provide both productivity and cost of ownership benefits.”