Hailed as a groundbreaking collaboration between the College of Nanoscale Science and Engineering of the University at Albany (CNSE) and IMEC, work will involve scientists from IBM and ASML.

“EUV lithography is a promising solution to further scale CMOS beyond the 32nm but still major challenges need to be overcome,” said Luc Van den hove, Executive Vice President and Chief Operating Officer at IMEC.

“Since EUV is still in a development phase, the alpha demo tools have to be upgraded occasionally. By opening our facilities for each others EUV experiments, we can guarantee acceleration of EUV research to our industrial partners,” noted Kurt Ronse, Lithography Program Director at IMEC.