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Photronics to host nano-imprint seminar |
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Sep 08, 2005 at 06:18 PM |
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Photronics, has said it will host a Technology Seminar on
nano-imprint lithography during the Micro and Nano Engineering Conference (MNE)
in Vienna, Austria on September 21, 2005. Leading researchers from ST Microelectronics,
Laboratoire des Technologies de la Microelectronique - CNRS, Leica and
Photronics will present their outlook on nano-imprint lithography applications,
process development, metrology, electron beam lithography for template
fabrication, template infrastructure development, and reticle enhancement
technology (RET) options for process nodes at and beyond 45nm.
"We have initiated a series of technology seminars
within the lithography community to share accomplishments and concerns
surrounding the future of mask technology and its applications, stated Dr.
Christopher Progler, Chief Technology Officer for Photronics "One concern
with bringing nano-imprint lithography to volume production is having access to
an adequate template supply. Partnerships are being established which improve
Photronics' manufacturing capability. Our participation in several strategic
initiatives are helping to build critical infrastructure such as process
transfer, proof of concept demonstration, and template standardization."
Other participants in the program include Molecular
Imprints, KLA-Tencor, Motorola Labs and the University of Texas at Austin. In
addition to the NIST ATP program, Photronics also fabricated imprint templates
for tool vendors and end users in the areas of photonics, light emitting diodes
(LED), thin film head and a variety of emerging nano technology applications.
More details about the seminar can be found at www.photronics.com
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