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Home arrow Lithography arrow News arrow Lithography arrow Cymer sets new EUV lithography laser power milestone
Cymer sets new EUV lithography laser power milestone Print E-mail
Dec 03, 2007 at 10:48 AM

CymerCymer has said that it demonstrated new burst peak power figures for its laser produced plasma (LPP) system using a multi-staged carbon dioxide (CO2) laser and tin (Sn) droplet target. At the recently held 2007 International EUVL Symposium in Sapporo, Japan, Cymer reached its initial goal of demonstrating 100 watts of extreme ultraviolet (EUV) burst power. 

“Our EUV research and development – which spans nearly a decade – continues its steady climb with this announcement,” said Bob Akins, Chief Executive Officer of Cymer. “This demonstration of 100 watts burst power is a reflection of our passion and dedication to leading the industry and in making EUV a capable and economically viable lithography technology.”

Coupled with its previously announced lifetime extensions for the multi-layer-mirror (MLM) collector, Cymer believes that it remains on course to help enable EUVL enter high-volume production.
Readers' comments
Comment by GUEST on 2007-12-04 11:08:14
I don't know of any R&D program topics which are allowed to go for more than several years, especially in lithography, and especially with industrial endorsement. Progress review must be nonexistent for this to happen.


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