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Home arrow News arrow Wafer Processing arrow Rohm and Haas’ new CMP pad manufacturing facility gains ISO 9001:2000 status
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Rohm and Haas’ new CMP pad manufacturing facility gains ISO 9001:2000 status Print E-mail
Nov 16, 2007 at 03:48 PM

ImageRohm and Haas Electronic Materials’ CMP Technologies has said that its newest plant in Hsinchu, Taiwan has achieved ISO 9001:2000 status for the manufacture of CMP polishing pads. The audit of Rohm and Haas’ CMP Technologies Asia-Pacific Manufacturing and Technical Center was completed by Det Norske Veritas Certification. 

“As part of our continuous improvement program, CMP Technologies has adopted an integrated manufacturing approach across its facilities,” explained Cliff Chen, Plant Manager of CMP Technologies Asia-Pacific Manufacturing and Technical Center. “Rapidly achieving ISO 9001:2000 certification for the new plant in Hsinchu was a key component of bringing this plant on-line and ensuring that it delivers the same standards of quality and consistency for which Rohm and Haas CMP pads are known worldwide.”
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