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Tool Order: Asia based IC manufacturer selects Micronic’s mask tool
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An Asia based IC manufacturer has placed an order with Micronic Laser Systems for its latest photomask pattern generator, the Sigma7500. The system will be shipped in 2008, the company said. The Sigma series covers an application space including both binary photomasks and phase shifting masks (PSM) at the 90nm, 65nm and 45nm technology nodes.
”The semiconductor industry is increasing its efforts to reduce the cost of volume chip production, and Sigma has proven to be an effective solution for reducing photomask costs,” said Carl-Johan Blomberg, Micronic CFO. “We are very pleased to see that this customer has chosen Sigma following an extensive evaluation, and look forward to a continued collaboration as the system is put into production.”