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Home arrow Blogs arrow Editor's Blog arrow November 2007 arrow Intel’s 45nm secrets soon to be revealed
Intel’s 45nm secrets soon to be revealed Print E-mail
Nov 12, 2007 at 07:03 PM
With the launch of Intel’s 45nm process via Penryn branding, it is clear to see that Intel marketing people are heavily pumping the chest with high-k (Intel marketing is hi-k) and the inclusion of metal gates (Intel marketing didn’t reinvent that one) as the ‘eco-friendly’ microprocessor.

What we have been waiting for is of course Chipworks' detailed strip-down of the Penryn, which is currently underway. To get up on the background to the material changes see here:

(http://www.chipworks.com/blogs.aspx)

Indeed, Dick James of Chipworks will be holding an evening seminar at The Churchill Hotel's Kalorama Room on the 11th December during the IEDM Conference in Washington DC, which should see him reveal more about Intel’s 45nm process - at least more than Intel will probably announce at the same conference!

I won’t be going to the IEDM Conference this year as we are expected to go to print with the latest edition of Fabtech that week, so someone please let me know all about it if a press release from Chipworks hasn’t been issued by then.

Penryn

 

Readers' comments
Comment by GUEST on 2007-11-13 17:35:18
Many people are indeed glossed over about high-k. There is still SiO2 interfacing the silicon; it has been thinned to less than a nanometer. On top of that there is 3 nm of the HfSiOx/HfO2. I wouldn't be surprised if nitrogen were incorporated as well. The SiO2 interfacial layer means EOT is still not scaling that fast.
Comment by GUEST on 2007-11-13 10:53:05
Ohhh the skeptic (http://www.fabtech.org/content/view/2420/) still having a problem accepting Intel has made a massive breakthrough.


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