Ron A. Synowicki, Greg K. Pribil, Gerry Cooney, Craig M. Herzinger & Steven E. Green, J. A. Woollam Co., Inc.

ABSTRACT

As immersion lithography continues to develop at a rapid pace it will be necessary to determine the refractive index n and k of immersion fluids since the fluid becomes an important element of the optical system. The refractive index of several candidate immersion fluids for 193nm and 157nm immersion lithography is demonstrated using the prismminimum deviation technique. Measurements have been implemented on a commercially available variable-angle spectroscopicellipsometer system capable of operation into the vacuum ultraviolet. Results compare very well to high-accuracy reference measurements performed at NIST.