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Environmentally-frinedly cost-effective cleaning solution |
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Oct 08, 2004 at 03:00 PM |
Product Briefing Outline: MKS Instruments, has introduced the
"LIQUOZON Single" - an ozonated water system that delivers ultra-pure
ozonated water for wafer and substrate cleaning during integrated
circuit processing. Designed specifically for installation in
single-wafer cleaning tools, the LIQUOZON Single system provides
cost-conscious fabs with a smaller footprint, lower gas and deionized
water consumption, easier installation, and enhanced technology.
Problem: Conventional cleaning poses major problems for fabs
with their methods of toxic chemical storage and handling, as well as
their costly consumption and disposal of those chemicals. By using
ozonated water as the cleaning agent, the LIQUOZON Single system offers
a clean, safe alternative with no compromise in process performance or
reliability, and significant reduction in waste disposal costs.
Solution: The self-contained LIQUOZON Single system generates
ultra-pure ozonated water at the point of use, eliminating the need for
chemical storage. The system does not generate NOx, a source of
contamination and possible attack of metal piping. It delivers
exceptionally high and accurate dissolved ozone concentrations (up to
55 ppm), and closed loop control ensures delivery at stable
concentrations, even at varying flow rates (designed and optimized for
0.5 to 20 liters/minute). Residual ozone that does not dissolve is
converted back to oxygen before it is released to the exhaust.
Applications: Single-wafer cleaning tools.
Platform: The system is virtually maintenance-free with an MTBF
greater than 20,000 hours. It has an extremely compact size of only
400x500x1200mm and has an outstanding performance density. Other
ozonated-water delivery systems in the MKS LIQUOZON product family
include LIQUOZON Smart, LIQUOZON 100, and the LIQUOZON XF, designed for
both wafer cleaning and resist removal in wet-bench applications.
Availability: July 2004 onwards.
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