|
Flavoured water found first by JSR |
|
|
|
Feb 04, 2005 at 08:00 PM |
JSR Corporation announced during SEMICON Japan that it has successfully
demonstrated 32nm line and space patterns using an ArF immersion
lithography system and the company's high refractive index solution, or
as some have dubbed it "flavoured water." JSR has developed the index
solution based on its SOLOnX technology.
32nm is commonly thought to be beyond the capability of water-based ArF
immersion systems. JSR believes the introduction of a high refractive
index (high n) liquid will extend ArF lithography over two technologies
nodes.
"This unique material is designed in house using our internal expertise
of the materials design," says Mitsunobu Koshiba, General Manager,
Electronic Materials Division of JSR Corporation. "We believe this will
be commercially viable and SOLOnX technology will offer a highly
transparent and low viscosity solution with an ideal refractive index
of 1.64."
|
News 
