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MIT Molecular Imprints reach technology licensing agreement |
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Feb 04, 2005 at 11:00 AM |
Molecular Imprints, Inc. (MII) has completed an exclusive licensing
agreement with the Massachusetts Institute of Technology (MIT) for the
use of the university's moiré fringe alignment technology, in MII's
Step and Flash Imprint Lithography " S-FIL" systems.
Professor Hank Smith from MIT led the effort to develop this technology and will be part of the ongoing development efforts.
MII anticipates using this technology as a primary vehicle for high
resolution alignment in advanced lithography applications. MII's CTO,
Dr. Sreenivasan, and his team have demonstrated 7nm, 3sigma alignment
with this technique, on an MII tool.
"I believe this is a very strong collaborative agreement, coupled with
strong research and development efforts, to advance the state of Step
and Flash Imprint Lithography." stated MII's CEO Norm Schumaker.
MII has also sold an Imprio 100 system to Hewlett-Packard. The
system delivers high resolution, sub-micron alignment, and
3-dimensional replication, to customers seeking cost-effective,
sub-100nm lithography.
"We are very excited that HP is using our system for advanced designs,"
said Dr. Norman Schumaker, President and CEO of Molecular Imprints. "In
addition to providing HP with the best technology, our goal is to now
offer a roadmap for future products."
Also the company has expanded its operations into Asia. Based in Tokyo,
Japan, Molecular Imprints, Japan will offer technology and applications
support for customers throughout the region. The office will also
provide assistance to Hakuto Co., Ltd and to KLA-Tencor. Hakuto is
MII's exclusive Asian distributor in the nanotechnologies-related
market segments, while KLA- Tencor is MII's exclusive sales and
services organization in the silicon-based markets for Asia and North
America.
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