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Innos adds to lithography capabillty |
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Feb 04, 2005 at 09:00 AM |
Innos Ltd, a UK based IC research and development company has added the
Nikon NSR-2005/i9C ‘step-and-repeat system' to its cleanroom. In the
past six months, Innos has invested heavily in its lithography
capabilities including the installation of the UK's irst JBX-9300FS
electron-beam lithography system in June. It now boasts high volume
wafer throughput, with photolithography capabilities down to 10nm.
"With the new i-line stepper and the electron-beam installed, Innos is
able to deliver both high volume wafer throughout and the writing of
complex patterns with ultra fine geometries on semiconductor substrates
down to a potential 10nm," commented Stephen Byars CEO of Innos.
Produced by Nikon, the lens of the NSR-2005/i9C achieves a resolution
of 0.45um and has a maximum exposure field of 22mm square, with 6-inch
recticles depending on the customer's needs. It includes a selection of
high-capability alignment sensor systems including LSA (laser step
alignment), plus optional FIA (field image alignment) and LIA (laser
interferometric alignment).
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