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Japanese fab selects 193nm molecular contamination monitors from Extraction |
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Feb 04, 2005 at 05:00 AM |
Extraction received an order for multiple TMB-193 real-time total
molecular base monitors from a leading semiconductor producer in Japan.
The customer chose the TMB-193 systems to support its need to
continuously monitor for molecular ontamination in 193nm lithography
tools and production areas.
"With low K1 193nm photoresist processing, we've got the perfect storm:
thinner more sensitive resists, longer double exposures, sub 10nm CD
budgets, and new amines in the manufacturing process," said Devon
Kinkead, president and CEO of Extraction. "As a result, our customers
can not afford contamination ‘blind spots'. The TMB-193 answers this
challenge by continuously detecting and measuring contaminants of
concern and we are honored to serve this leading Japanese chipmaker
with our just released TMB-193 process monitoring technology."
The TMB-193 uses chemiluminescence, a highly reliable, accurate and
rugged detection technology not found in competing monitors, according
to the company. Extraction developed the system in conjunction with a
companion periodic monitoring tool - the LithoScout sampling and
reporting system.
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Lithography 
