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SPIE Litho nuggets: Gomba says Big Blue not inserting EUVL at 22 nm HP |
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Feb 26, 2007 at 05:27 PM |
During his slightly informercialish plenary talk on a collaborative approach to immersion lithography at SPIE Advanced Lithography this morning, IBM's George Gomba made one thing perfectly clear: IBM will not be using EUV lithography anytime soon.
"EUVL will be late for manufacturing insertion," he said, so Big Blue will be focusing on a water-based immersion approach---using double patterning and souped-up DFM, RET, and other computational litho techniques---for the 22-nm half-pitch node.
If a full chip has yet to be produced with EUVL, he wondered, "can we really take R&D tools to production by 2011? It will be very, very challenging."
I wonder if Intel and its EUVL partners---still intent on hitting that 2011 roadmap date and resolutely sticking to the probability of a 32-nm HP introduction---are up to the challenge?
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