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Defect review optimised for multi-tasking |
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Feb 04, 2005 at 07:00 PM |
 Product Briefing Outline: Applied Materials, has
unveiled the "Applied SEMVision" G2 family, which the company claims is
the industry's fastest, most sensitive line of defect review and
analysis tools for 65nm manufacturing. The new line of three systems
sets the industry benchmark with 30nm sensitivity and throughputs of up
to 1,800 defects per hour. Used in an optimised defect review strategy,
these systems can accelerate customers' production ramp by rapidly
identifying the root cause of systematic and yield-limiting defects,
according to the company.
Problem: The need for defect review has greatly increased and is now
the third largest segment in the defect reduction market.SEMVision G2
family development is claimed to be a direct response to customers'
need for a set of next-generation tools optimised for different
applications, enabling flexible system utilization during all stages of
production ramp at the lowest overall cost.
Solution: The new SEMVision family addresses the trend to achieve
faster time to Resolution by harnessing the combined power of process
and inspection expertise to dramatically cut the time and cost of
resolving yieldlimiting defects. The SEMVision G2 product line includes
the new Applied SEMVision G2 HP (high productivity) tool, the most
productive system available for performing routine defect review and
production process monitoring. The G2 HP provides a significant
reduction in cost of ownership over previous tools, achieving
world-class efficiency and lowest cost per defect, the company claims.
The new Applied SEMVision G2 Plus is the production workhorse system
for volume defect review and material analysis, offering tilt and
EDX(1) capabilities. As the ultimate system for inline root cause
analysis, the recently introduced Applied SEMVision G2 FIB(1) system,
with integrated focused ion beam technology, provides complete
capability for embedded defect and electrical failure analysis.
Applications: Defect review 65nm node and below.
Platform: All three systems share the same proven platform, including
the capability to share recipes, a common user interface and
algorithms. This is claimed to be a unique commonality, which shortens
set-up time through extensive recipe sharing and provides high tool
availability.
Availability: December 2004 onwards.
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Product Briefings 
